Abstract: Curvilinear (CL) mask patterns, essential for extreme ultraviolet lithography in advanced semiconductor manufacturing, suffer from degraded fidelity and contrast due to complex pattern ...

This is the official implementation of our paper Scalable Graph Generative Modeling via Substructure Sequences, a self-supervised extension of our ICML'25 work GPM. G2PM addresses the fundamental ...

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This past year made it clearer than ever that our health care field, held together by patch after patch since 1965, is not sustainable. Some of the patches that we need to keep going are gone, and ...